@article {Zgrabik:15,
	title = {Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications},
	journal = {Opt. Mater. Express},
	volume = {5},
	number = {12},
	year = {2015},
	month = {Dec},
	pages = {2786{\textendash}2797},
	publisher = {OSA},
	abstract = {Alternative materials for plasmonic devices have garnered much recent interest. A promising candidate material is titanium nitride. Although there is a substantial body of work on the formation of this material, its use for plasmonic applications requires a more systematic and detailed optical analysis than has previously been carried out. This paper describes an initial optimization of sputtered TiN thin films for plasmonic performance from visible into near-IR wavelengths. The metallic behavior of TiN films exhibits a sensitive dependence on the substrate and deposition details. We explored reactive and non-reactive sputter deposition of TiN onto various substrates at both room temperature and 600\&\#x00B0;C. Metallic character was compared for films grown under different conditions via spectroscopic ellipsometry and correlated with compositional and structural measurements via x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), and scanning transmission electron microscopy (STEM).},
	keywords = {Deposition and fabrication, Ellipsometry and polarimetry, optical properties, plasmonics, Surface photoemission and photoelectron spectroscopy, Thin films},
	doi = {10.1364/OME.5.002786},
	url = {http://www.osapublishing.org/ome/abstract.cfm?URI=ome-5-12-2786},
	author = {Christine M. Zgrabik and Hu, Evelyn L.}
}
